| Module title |
Optoelectronics R1a |
| Courses |
Title |
Type |
his-lsf
course identifier |
SWS |
Credits |
Performance
requirements/Examination |
| Microsystem
Technology (lec) |
lecture |
FB16-5267 |
2 |
3 |
oral exam (30 minutes) |
| Technology
of Electronic and Optoelectronic Devices (lec) |
lecture |
FB16-8500 |
2 |
3 |
oral exam (30
minutes) |
| Module credits |
6 |
| Language |
English |
| Held |
in summer
semester, annually |
| Lecturer |
Hillmer and
team |
| Responsibles(s) |
Hillmer |
| Required
qualifications |
Basic knowledge
on semiconductor devices (transistor, laser diode, LED, photo diode),
material science and optics |
| Workload |
60
hours course attendance
120 hours self-study |
| Contents |
- Introduction to modern fabrication processes,
technology of fibers, wave guides,
lasers
- Crystal growth: semiconductor wafers, thin layer
epitaxy
- Lithography: optical, X-ray, electron-beam, ion-beam,
EUVL, nano imprint
- Plasma processing and vacuum technology
- Deposition techniques: evaporation, sputtering,
plasma assisted techniques
- Dry and wet-chemical etching and clean room technology
- Fabrication technology of electronic devices (planar
transistor, electronic integrated
chips), optoelectronic devices (semiconductor lasers, gratings) and
micro-optoelectro-
mechanical systems (MOEMS)
- Introduction to micromachining, microsystem
techniques, miniaturization, packaging
and nanotechnology
- Reasons for miniaturization and integration, types of
micromachining
- Sensors and actuators
- Large variety of MEMS and MOEMS examples: membranes,
springs, resonator
elements, cantilevers, valves, manipulation elements, gripping tools,
light
modulators, optical switches, beam splitters, projection displays,
micro optical
bench, data distribution, micromachined tunable filters and lasers
- Displays: micromachined (micromirror) displays, laser
display technology, vacuumelectronics
- Lab tour in the clean room.
|
| Literature |
- R. Williams, Modern GaAs Processing Methods, Artech
House Inc.,
ISBN 0-89006-343-5, 1990.
- W. Menz, J.Mohr and O. Paul, Microsystem Technology,
VCH-Verlag, 2001.
- K. Iga, S. Kinoshita, Process technology for
semiconductor lasers, Springer, Series
in Material Science 30, 1996.
- B. Bhushan (Editor), Springer Handbook of
Nanotechnology, Springer, 2004.
|
| Media |
Beamer
(presentation), black board (derivations, explanations), paper
(exercises). |
| Objectives |
- Understanding the fundamentals in micromachining,
micro-opto-electro-mechanical
systems (MOEMS) and optical MOEMS
- Understanding the fundamentals of semiconductor
technology including specific
processes, schemes and required instrumentation
- Methodology, interdisciplinary aspects, future
perspectives and market trends
- Finding solutions using interdisciplinary analogies
- Establishing synergies between engineering
disciplines and natural sciences
- Introduction to the 21st century as the
“century of photonics and nano technology”.
|
| Competences to be
acquired |
- Knowledge in micromachining, devices, thin layer and
clean room technologies
- Methodology in specialized miniaturization schemes
and integration of electronic
and optoelectronic devices and systems
- Knowledge of design, fabrication and use of
nanoelectronic, (opto-)electronic and
micromachined devices.
|
